Kb. Joelsson et al., Er doping of Si and Si0.88Ge0.12 using Er2O3 and ErF3 evaporation during molecular beam epitaxy - A transmission electron microscopy study, J CRYST GR, 196(1), 1999, pp. 97-110
The incorporation behavior of Er into Si and Si0.88Ge0.12 using ErF3 and ER
2O3 as dopant sources during molecular beam epitaxy has been studied. The E
r-compounds were thermally evaporated from a high-temperature source. Disso
ciation of Er2O3 took place and reaction with graphite parts in the high te
mperature source gave an increased CO background pressure and evaporation o
f metallic Er. Surface segregation of Er may be strong, but with a high CO
or F background pressure, the surface segregation could be reduced and shar
p Er concentration profiles were obtained. Transmission electron microscopy
analysis shows that it is possible to prepare high crystalline quality str
uctures with Er concentrations up to 4x10(19) cm(-3) using Er2O3 and a high
F background pressure. Using ErF3 compound as source material a F/Er incor
poration ratio of approximately three has been measured by secondary ion ma
ss spectrometry. Fluorine incorporation can occur not only from evaporated
units of ErF3 molecules, but also from CFx (x = 1-4) and F background speci
es, which are present due to a reaction between the ErF3 source material an
d the graphite crucible in the source. After careful degassing of the sourc
e, the partial pressures of these species can be significantly reduced. By
producing an Er-doped multilayer structure consisting of alternating doped
layers grown at low temperature (350 degrees C) and undoped layers grown at
a higher temperature (630 degrees C), a flat surface could be maintained d
uring the growth sequence. In this way it was possible to prepare Er-doped
structures with an average Er concentration of 1 x 10(19) cm(-3) and withou
t observable defects using ErF3 as source material. For the case of Er-dopi
ng of Si0.88Ge0.12 using ErF3, we observed contrast along lines in the grow
th direction at an Er concentration of 1 x 10(19) cm(-3), which was attribu
ted to Si concentration variations. Intense emission related to Er has been
observed by electro- and photoluminescence. (C) 1999 Elsevier Science B.V.
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