Ternary and quaternary antimonide devices for thermophotovoltaic applications

Citation
Cw. Hitchcock et al., Ternary and quaternary antimonide devices for thermophotovoltaic applications, J CRYST GR, 195(1-4), 1998, pp. 363-372
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
195
Issue
1-4
Year of publication
1998
Pages
363 - 372
Database
ISI
SICI code
0022-0248(199812)195:1-4<363:TAQADF>2.0.ZU;2-0
Abstract
Thermophotovoltaic (TPV) devices have been fabricated using epitaxial terna ry and quaternary layers grown on GaSb substrates. GaInSb ternary devices w ere grown by metalorganic vapor-phase epitaxy (MOVPE) with buffer layers to accommodate the lattice mismatch, and GaInAsSb lattice-matched quaternarie s were grown by MOVPE and by liquid-phase epitaxy (LPE). Improved devices a re obtained when optical absorption occurs in the p-layer due to the longer minority carrier diffusion length. Thick emitter p/n devices are limited b y surface recombination, with highest quantum efficiency and lowest dark cu rrent being achieved with epitaxially grown surface passivation layers on l attice-matched MOVPE quaternaries. Thin emitter/thick base n/p devices are very promising, but require improved shallow high-quality n-type ohmic cont acts. (C) 1998 Elsevier Science B.V. All rights reserved.