Ga1-xInxNyAs1-y with a few percent In and N has recently been demonstrated
as a 1 eV material lattice-matched to GaAs. Similarly, it is expected that
for Ga0.5-xIn0.5+xNyAs1-y, which is lattice-matched to InP, band gaps from
similar to 0.7-0.3 eV should be achievable if a few percent N could be inco
rporated. I Here, we compare the growth of GaInNAs/InP with GaInNAs/GaAs. E
pilayers of both alloy compositions were grown under comparable conditions
by metal-organic vapor-phase epitaxy (MOVPE) with dimethylhydrazine. For Ga
InNAs/GaAs, nitrogen concentrations as high as 3% were measured, with corre
sponding bandgaps down to 0.96 eV. In contrast, for GaInNAs/InP, secondary
ion mass spectroscopy (SIMS) measurements show a N concentration at least 1
00 times smaller in GaInNAs/InP than in GaInNAs/GaAs at comparable growth c
onditions, and, consistent with this observation, no bandgap depression is
seen. Thus, N incorporation in GaInNAs falls off superlinearly with In conc
entration. Possible reasons for this are discussed. (C) 1998 Elsevier Scien
ce B.V. All rights reserved.