Resonant self-organization in semiconductor growth

Citation
J. Temmyo et al., Resonant self-organization in semiconductor growth, J CRYST GR, 195(1-4), 1998, pp. 516-523
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
195
Issue
1-4
Year of publication
1998
Pages
516 - 523
Database
ISI
SICI code
0022-0248(199812)195:1-4<516:RSISG>2.0.ZU;2-H
Abstract
We describe, for the first time, resonant self-organization using a novel t echnique that combines selective epitaxy with the Turing-type self-organiza tion phenomenon in the InGaAs/AlGaAs system on GaAs (3 1 1)B surface during metalorganic vapor-phase epitaxy. The resonant self-organization indicates a direct experimental evidence of nonlinear cooperative phenomenon in semi conductor growth. (C) 1998 Elsevier Science B.V. All rights reserved.