Specific features of electron structures of some thin film d-silicides

The Si L-2,L-3-spectra of thin films of transition d-metal (TM) silicides ( d-silicides) obtained by the ultrasoft X-ray emission spectroscopy (USXES) method have been analyzed on the basis of our d-s,p resonance model. Differ ent stoichiometric composition silicides were obtained depending on the ann ealing conditions of heterostructures TM/Si mono TM/SiO2/Si mono. Compared with the spectra of the bulk samples, Si L-2,L-3-spectra of thin film silic ides demonstrate an increased intensity in the high energy range near the F ermi level. The unique sharp intensive peak of the Si s-state at the Fermi level is a consequence of the distinction of d-s resonance in NiSi2. (C) 19 98 Elsevier Science B.V. All rights reserved.