X-ray absorption near edge structure (XANES) measurements at the Si and N K
-edges of ternary Si-C-N compounds are applied to analyze the changes of st
ructural units owing to the thermally induced ceramization of silicon dicar
bodiimide Si(N=C=N)(2) at temperatures up to 1600 degrees C. Samples synthe
sized below 800 degrees C show an environment of silicon consisting of carb
odiimide (N=C=N) groups. Further annealing leads to a crystalline phase, Si
2CN4, which combines the structural units (Si-N-Si) and (Si-N=C=N). Recorde
d spectra of samples annealed at temperatures higher than 1200 degrees C sh
ow the decomposition of Si2CN4 The material then transforms to a Si3N4-SiC
composite material through an intermediate amorphous Si-C-N phase. (C) 1998
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