Ms. Liao et Qe. Zhang, Chemical bonding in XeF2, XeF4, KrF2, KrF4, RnF2, XeCl2, and XeBr2: From the gas phase to the solid state, J PHYS CH A, 102(52), 1998, pp. 10647-10654
This paper presents a systematic investigation of chemical bonding in a ser
ies of noble-gas halides in both the gas phase and the solid state. The cry
stalline environment was simulated by a cutoff type Madelung potential. Geo
metries, dissociation energies, force constants, and enthalpies of formatio
n and of sublimation were determined. The calculated properties are in good
agreement with available experimental data. The crystal field model is cap
able of reproducing all significant differences observed between the gas ph
ase and the solid state. KrF4, XeCl2 and XeBr2 are predicted to be rather u
nstable against molecular dissociation. The stabilities of the dihalides fo
llow the order KrF2 much less than XeF2 < RnF2 and XeF2 much greater than X
eCl2 approximate to XeBr2. The calculated trends account for the fact that
only the heavier noble gases form compounds and that the electronegativity
of the ligand has to be large. The outer polarization orbitals play an impo
rtant role in the bonding. Relativistic effects on the molecular properties
are negligible.