The authors report on the fabrication of 0.18 mu m gale length n-type
Si/Si60Ge40 modulation-doped field-effect transistors (MODFETs) with i
mproved RF performance. The 2D electron gas channel, a strained Si lay
er grown on a relaxed 2 mu m thick graded Si60Ge40 buffer shows high m
obility (mu = 1190cm(2)/Vs at room temperature). High DC transconducta
nces (up to 270mS/mm at room temperature), high saturation currents (2
60mA/mm) due to reduced parasitic series resistances (R-S less than or
equal to 0.2 Omega mm) and high carrier densities (n(s) = 1.9 x 10(12
)cm(-2)) are achieved. Very good RF characteristics have been found fo
r the non-recessed device structure with cutoff frequencies up to f(T)
= 46GHz and a record of f(max) = 81GHz at low supply voltages around
1.5V.