THIN-FILM GOLD ELECTRODES PRODUCED BY MAGNETRON SPUTTERING - VOLTAMMETRIC CHARACTERISTICS AND APPLICATION IN BATCH INJECTION-ANALYSIS WITH AMPEROMETRIC DETECTION

Citation
Amo. Brett et al., THIN-FILM GOLD ELECTRODES PRODUCED BY MAGNETRON SPUTTERING - VOLTAMMETRIC CHARACTERISTICS AND APPLICATION IN BATCH INJECTION-ANALYSIS WITH AMPEROMETRIC DETECTION, Electroanalysis, 9(3), 1997, pp. 209-212
Citations number
11
Categorie Soggetti
Chemistry Analytical
Journal title
ISSN journal
10400397
Volume
9
Issue
3
Year of publication
1997
Pages
209 - 212
Database
ISI
SICI code
1040-0397(1997)9:3<209:TGEPBM>2.0.ZU;2-Y
Abstract
Thin-film gold electrodes were produced by radio-frequency sputtering using a polyvinyl chloride foil as substrate. The voltammetric behavio r was characterized in various electrolyte solutions. In alkaline and neutral aqueous solutions reliable voltammetric measurements can be pe rformed while in acidic media some nondefined phenomena occur. A novel type of electrode for batch injection analysis (BIA) is presented whi ch is produced from circular pieces of the thin-film material. This el ectrode can be used for BIA in conventional voltammetric cells. Pulsed amperometric detection is demonstrated to be viable with thin-film go ld electrodes and shows analytical advantages over constant-potential detection in the BIA of hydrogen peroxide.