THIN-FILM GOLD ELECTRODES PRODUCED BY MAGNETRON SPUTTERING - VOLTAMMETRIC CHARACTERISTICS AND APPLICATION IN BATCH INJECTION-ANALYSIS WITH AMPEROMETRIC DETECTION
Amo. Brett et al., THIN-FILM GOLD ELECTRODES PRODUCED BY MAGNETRON SPUTTERING - VOLTAMMETRIC CHARACTERISTICS AND APPLICATION IN BATCH INJECTION-ANALYSIS WITH AMPEROMETRIC DETECTION, Electroanalysis, 9(3), 1997, pp. 209-212
Thin-film gold electrodes were produced by radio-frequency sputtering
using a polyvinyl chloride foil as substrate. The voltammetric behavio
r was characterized in various electrolyte solutions. In alkaline and
neutral aqueous solutions reliable voltammetric measurements can be pe
rformed while in acidic media some nondefined phenomena occur. A novel
type of electrode for batch injection analysis (BIA) is presented whi
ch is produced from circular pieces of the thin-film material. This el
ectrode can be used for BIA in conventional voltammetric cells. Pulsed
amperometric detection is demonstrated to be viable with thin-film go
ld electrodes and shows analytical advantages over constant-potential
detection in the BIA of hydrogen peroxide.