Ok. Varghese et Lk. Malhotra, Electrode-sample capacitance effect on Ethanol sensitivity of nano-grainedSnO2 thin films, SENS ACTU-B, 53(1-2), 1998, pp. 19-23
Tin oxide thin films were deposited on float glass, Coming 7059 glass and a
lumina substrates by sol-gel technique using SnCl2. 2H(2)O as a precursor.
The average crystallite size, determined by X-ray diffraction (XRD) was sim
ilar to 4.5 nm for films on float glass and similar to 9.0 nm for films on
Coming and alumina substrates. Atomic force microscope (AFM) studies confir
med the nano-grained structure of the films. It was observed that the sampl
es retain some charge after switching off the 9V de bias applied to them fo
r sensitivity measurements. This charge was found to decay with time. The a
mount of charging was considerably low if the samples were kept in a vacuum
similar to 10(-2) Pa or at temperatures < 573 K. Exposure of the samples t
o ethanol vapour eliminates the charging effect. The effect was found to be
prominent in films on float glass substrates and very small in films on Co
ming and alumina substrates. The films on float glass showed an extremely h
igh sensitivity (similar to 240 for 700 ppm of ethanol) to ethanol vapour.
A lesser sensitivity was obtained for films on Coming and alumina substrate
s (similar to 70 for films on both the substrates for 700 ppm of ethanol).
The occurrence of high sensitivity has been correlated with the grain size
as well as the charging effect which is attributed to the accumulation of t
he chemisorbed oxygen ions at the electrode-sample contact region on the ap
plication of the de bias. These accumulated ions form a capacitor at the el
ectrode-sample contact region and increase the depletion layer width near t
his region. Reduction of this capacitance and depletion layer width in the
presence of ethanol increases the current in the circuit, thereby increasin
g the sensitivity. Due to the larger grain size and negligible charging eff
ect for films on coming and alumina substrates, the sensitivity was less fo
r films on these substrates. (C) 1998 Elsevier Science S.A. All rights rese
rved.