Studies with Ni/Ti multilayer films using X-ray photoelectron spectroscopyand neutron reflectometry: microscopic characterization of structure and chemical composition

Authors
Vedpathak, M Basu, S Gokhale, S Kulkarni, SK
Citation
M. Vedpathak et al., Studies with Ni/Ti multilayer films using X-ray photoelectron spectroscopyand neutron reflectometry: microscopic characterization of structure and chemical composition, THIN SOL FI, 335(1-2), 1998, pp. 13-18
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
335
Issue
1-2
Year of publication
1998
Pages
13 - 18
Database
ISI
SICI code
0040-6090(199812)335:1-2<13:SWNMFU>2.0.ZU;2-T
Abstract
X-ray photoelectron spectroscopy (XPS) and neutron reflectometry (NR) have been performed on Ni/Ti multilayer films, deposited by electron beam evapor ation, under ultra high vacuum. Chemical composition of the layers has been obtained from XPS analysis. The layer thicknesses and densities have been obtained within few angstroms from NR. Impurities were detected in the film in the form of carbides and oxides in the Ti layers and in elemental form in the Ni layers. From an in situ XPS experiment on a Ti film with Ni overl ayer we found that impurities get incorporated in the film during depositio n. (C) 1998 Elsevier Science S.A. All rights reserved.