We describe a UHV sample holder that allows fast heating and cooling cycles
between 77 K and 1300 K. The system allows us to perform thermal treatment
of a sample. The samples are heated by electron bombardment and the cooldo
wn is achieved by liquid nitrogen (LN2). The sample holder is designed to b
e assembled in a multitechnique surface analysis apparatus that performs AE
S, SIMS, TDS and XPS analysis. (C) 1998 Elsevier Science Ltd. All rights re
served.