High performance sputtered carbon coatings for applications

The Closed Field Un-Balanced Magnetron Sputter Ion Plating (CFUBMSIP) proce ss is now routinely used in a production environment and is characterised b y a high degree of flexibility in terms of the substrates and coating mater ials which can be used. Compared to classical magnetron sputtering the clos ed field system produces higher ion current density which gives high qualit y coatings and excellent adhesion. The ability to vary the deposition param eters over a wide range, permits the modification of not only the compositi on and the structure but also the morphology (density and growth mode) of t he films. This paper describes, that in particular, a range of carbon coati ngs from transparent, electrically insulating to black, conductive coatings , can be produced. Tribological tests concerning adherence, hardness and we ar properties in atmospheric and lubricated conditions are presented. The e ffects of the nature of the substrates with different hardness properties ( M42, stainless steel and Al) are investigated. (C) 1998 Elsevier Science Lt d. All rights reserved.