Fundamentals of plasma and sputtering processes

Fundamental studies of plasma and sputtering processes mainly carried out i n the authors' laboratories have been surveyed and discussed in the relatio n to the application to sputter deposited thin films. Experimental results on target, substrate and transportation phenomena have been presented The b ombarding effect by energetic particles on substrates during plasma and spu ttering processes on the interface structures between sputter deposited thi n films and substrates was discussed. (C) 1998 Published by Elsevier Scienc e Ltd. All rights reserved.