Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

The noble gases' (Ar, He and Ne) influence on the TiN deposition by reactiv e radio frequency (rf) magnetron sputtering have been studied. Effects of t he interelectrode distance and the discharge power were also taken into acc ount The optical diagnostics of plasma was carried out The characteristics of Ti emission (395.82 nm) from titanium atoms and N-2(+) emission (391.44 nm) of the first negative system were investigated in detail. Ti (395.82 nm )/Ni-2(+) (391.44 nm) intensity ratio between Ti/N-2 emission was correlate d with the deposition rate of the films. The enhancement of the TiN (111) p eak intensity in the neon or helium presence in the ternary gas mixtures (A r + N-2 + Ne), (Ar + N-2 + He) was emphasized. (C) 1998 Elsevier Science Lt d. All rights reserved.