Highly corrected submicrometer grid patterning on curved surfaces

A compact holographic projector system was built and tested. This projectio n system offers a practical approach for making a highly corrected mesh or grid pattern on curved surfaces. The pattern can range in size from multimi crometer to submicrometer dimensions and be recorded in either positive or negative photoresist. Standing-wave interference patterns in the form of a diverging close-packed lattice of either hexagonal or square rodlike intens ity maxima extending outward from a point or a locus of points are produced by multiple-beam holography that involves the combination of a holographic diffraction grating and a hypercomatic focusing objective. (C) 1999 Optica l Society of America.