Fabrication and sensing applications of microelectrodes on silicon substrates

Citation
Mk. Andrews et Pd. Harris, Fabrication and sensing applications of microelectrodes on silicon substrates, ELECTROANAL, 10(16), 1998, pp. 1112-1118
Citations number
15
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ELECTROANALYSIS
ISSN journal
10400397 → ACNP
Volume
10
Issue
16
Year of publication
1998
Pages
1112 - 1118
Database
ISI
SICI code
1040-0397(199811)10:16<1112:FASAOM>2.0.ZU;2-S
Abstract
The unique properties of microelectrodes have been appreciated by electroch emists for some years, but the development of sensors which use these prope rties, in particular the high diffusion rates near the electrodes, has been slow. We consider first the dimensions which define microelectrodes. Silic on fabrication methods are well able to reach these, but the technology, ou tlined for a simple case of the production of an electrode array, is specia lized. Progress in developing sensors will best be made by collaborations b etween engineering and electrochemistry groups. Examples of sensors and dev ices which utilize microelectrodes are given. Three depend on the high diff usion fluxes which can be established near microelectrodes, and one uses th e fact that microstructures can be made which have features comparable in s ize to living cells. The resulting nonuniform electric fields allow cells t o be manipulated.