Thin stainless steel films were prepared by sputter deposition onto silicon
substrates using a 304 stainless steel target. The film composition was es
sentially that of 304 stainless steel, but they had a body-centered cubic s
tructure and were free of sulfide inclusions. Potentiodynamic polarization
curves were obtained for thin films in various chloride-containing solution
s and compared to results from conventional stainless steel samples. In add
ition, video images of two-dimensional pits in thin films were used to dete
rmine the anodic pit current density as functions of potential and chloride
concentration. Thin stainless steel films were found to be significantly m
ore resistant to pit initiation than their bulk counterparts, but pit propa
gation was possible at relatively low potentials. A diffusion-controlled gr
owth regime was identified at high potentials, with a transition to mixed a
ctivation/ohmic control at lower potentials (just above that required for r
epassivation). (C) 1999 The Electrochemical Society. S0013-4651(98)04-038-5
. All rights reserved.