Glass-to-glass bonding for vacuum packaging of field emission display in an ultra-high-vacuum chamber using silicon thin film

Citation
Wb. Choi et al., Glass-to-glass bonding for vacuum packaging of field emission display in an ultra-high-vacuum chamber using silicon thin film, J ELCHEM SO, 146(1), 1999, pp. 400-404
Citations number
20
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
146
Issue
1
Year of publication
1999
Pages
400 - 404
Database
ISI
SICI code
0013-4651(199901)146:1<400:GBFVPO>2.0.ZU;2-0
Abstract
Field emission displays (FEDs) are among the most promising flat panel disp lays, and require a high vacuum for long-term performance and reliability. In this paper, glass-to-glass electrostatic bonding is presented for provid ing an in situ vacuum packaging of an FED panel in an ultra-high-vacuum cha mber, based on a conventional Si-to-glass anodic bonding mechanism. Using r adiofrequency sputter deposition, amorphous silicon films have been formed on Sn-doped In2O3 coated glass substrates. Secondary ion mass spectroscopy was used to characterize the kinetics of the glass-to-glass electrostatic b onding. In order to investigate the applicability of this bonding technique to the in situ vacuum packaging of FED devices, the hermetic sealing test of FED panels with an exhausting hole sealed by this technique was experime nted under 10(-8) Torr vacuum level. This technique is suitable for mass pr oduction environments since it is capable of high-speed sealing and elimina ting the outgassing problem. (C) 1999 The Electrochemical Society S0013-465 1(98)01-017-9. All rights reserved.