Citation
M. Schmid et al., Oxygen-induced vacancy formation on a metal surface, PHYS REV L, 82(2), 1999, pp. 355-358
Citations number
20
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007
→ ACNP
Volume
82
Issue
2
Year of publication
1999
Pages
355 - 358
Database
ISI
SICI code
0031-9007(19990111)82:2<355:OVFOAM>2.0.ZU;2-U
Abstract
Using scanning tunneling microscopy, low-energy ion scattering, and quantit
ative low-energy electron diffraction, we find about 17% metal vacancies on
the oxygen-covered Cr(100) surface. The oxygen atoms occupy all the hollow
sites of the first layer, including those neighboring a Cr vacancy. We arg
ue that the vacancy formation is energetically favored and not caused by st
ress but by electronic effects.