Micromagnetics and magnetoresistance of a Permalloy point contact

Citation
Rp. Van Gorkom et al., Micromagnetics and magnetoresistance of a Permalloy point contact, APPL PHYS L, 74(3), 1999, pp. 422-424
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
3
Year of publication
1999
Pages
422 - 424
Database
ISI
SICI code
0003-6951(19990118)74:3<422:MAMOAP>2.0.ZU;2-K
Abstract
We performed micromagnetic calculations for a Permalloy point contact. The magnetization configurations show the formation of a Neel wall in the const riction. The occurrence of a Neel wall instead of a Bloch wall results from the dipole-dipole energy in this region. The evolution of the magnetizatio n with field differs strongly for fields parallel and perpendicular to the electrodes. In the former case, the pattern evolves abruptly and in a narro w range, while in the latter case it evolves smoothly and in a rather wide range. From the magnetization patterns, we estimate the domain-wall magneto resistance and the anisotropic magnetoresistance, which we compare with exp erimental data. (C) 1999 American Institute of Physics. [S0003-6951(99)0110 3-1].