Perfectly conformal TiN and Al2O3 films deposited by atomic layer deposition

Authors
Ritala, M Leskela, M Dekker, JP Mutsaers, C Soininen, PJ Skarp, J
Citation
M. Ritala et al., Perfectly conformal TiN and Al2O3 films deposited by atomic layer deposition, CHEM VAPOR, 5(1), 1999, pp. 7-9
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
5
Issue
1
Year of publication
1999
Pages
7 - 9
Database
ISI
SICI code
0948-1907(199901)5:1<7:PCTAAF>2.0.ZU;2-B