Thin films of lead titanate (PbTiO3-PT) have been prepared in-situ on SrTiO
3 (100) substrates using radio-frequency sputtering. The epitaxial quality
of the films has been investigated as a function of the substrate temperatu
re. Stoichiometric films have been obtained in the temperature range 550 de
grees C-600 degrees C. Films have a high degree of c-axis oriented crystall
ine structure. The optimum conditions for growing epitaxial PbTiO3 layers a
re reported in this study. Thin films grown at 550 degrees C exhibited a ro
cking curve full width at a half maximum (FWHM) of 0.26 degrees. The refrac
tive index calculated from optical transmission method has been evaluated t
o 2.61 @ 632.8nm, which represents 98% of the corresponding bulk material.