High temperature syntheses of novel nitrido- and oxonitrido-silicates and sialons using rf furnaces

Citation
W. Schnick et al., High temperature syntheses of novel nitrido- and oxonitrido-silicates and sialons using rf furnaces, J MAT CHEM, 9(1), 1999, pp. 289-296
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS CHEMISTRY
ISSN journal
09599428 → ACNP
Volume
9
Issue
1
Year of publication
1999
Pages
289 - 296
Database
ISI
SICI code
0959-9428(199901)9:1<289:HTSONN>2.0.ZU;2-4
Abstract
The high-temperature reaction of pure metals with silicon diimide Si(NH)(2) in a specially developed radiofrequency furnace has been successfully appl ied to the synthesis of novel highly condensed nitridosilicates. With SrCO3 as an additional starting material this procedure has now been extended to the synthesis of oxonitridosilicates and oxonitridoaluminosilicates (sialo ns). Two novel sialons SrSiAl2O3N2 [space group P2(1)2(1)2(1) (no. 19), a = 491.89(6), b = 789.73(7), c = 1134.94(18) pm, Z = 4] and SrErSiAl3O3N4 [sp ace group P6(3)mc (no. 186), a = 606.53(3), c = 985.90(8) pm, Z = 2] have b een obtained as coarsely crystalline materials. According to single crystal X-ray diffraction both compounds adopt structure types which are unprecede nted for sialons. They derive from the nitridosilicates LnSi(3)N(5) (Ln = L a, Ce, Pr, Nd) and MYbSi4N7 (M = Sr, Ba, Eu),respectively, by partial subst itution of Si by Al and N by O. For SrSiAl2O3N4 and SrErSiAl3O3N4 an unambi guous crystallographic differentiation between the tetrahedral centres (Al and Si) as well as the bridging atoms of the framework structures (N and O) seems reasonable.