K. Saitou, Effect of arc current and voltage on production rate of copper ultrafine particles by Ar-H-2 arc plasma method, J JPN METAL, 62(12), 1998, pp. 1117-1122
Production of copper ultrafine particles by means of an Ar-H-2 are plasma m
ethod was performed using a graphite crucible. The are voltage and the are
current were taken as the influence factors affecting on the generation rat
e of ultrafine particles and the effect of these factors on the generation
rate was studied. The temperature of the crucible close to the melted sampl
e was measured and the relation between the temperature and the generation
rate was investigated.
Experiments were carried out under an Ar-50%H-2 mixed gas at atmospheric pr
essure and the are generation condition of 25 similar to 40 V and 90 simila
r to 220 A.
The generation rate of ultrafine particles at constant are voltage increase
d with increasing are current and increased with increasing are voltage at
constant are current. However, when the generation rate was arranged with a
n electric power as a product of the voltage and the current, it depended s
olely on the electric power. These results were discussed from the viewpoin
t of the velocity of the plasma jet generated from the cathode and an anode
heating by electrons.
The temperature of the crucible increased with increasing electric power an
d had a tendency to approach saturation. The temperature was affected inten
sively by an average temperature of the melted sample, so that an evaporati
on enthalpy of copper was obtained as a value of 170-230 kJ/mol using the r
ate process based on the assumption that the measured temperature is the va
porization temperature of the sample.