Penning type magnetron sputtering source and its use in the production of carbon nitride coatings

This article describes the design and construction of a Penning type sputte r magnetron which is referred to as the Dimag source. This device is capabl e of producing intense discharges at pressures well below those obtainable using a conventional magnetron source. Expressions used to describe the ass ociated magnetic field are highlighted. An account of the effective potenti al well as seen by charged species within the plasma is given. Various oper ational parameters are described. The device is used to produce carbon nitr ide coatings with high atomic percent nitrogen incorporation. (C) 1999 Amer ican Vacuum Society. [S0734-2101(99)05001-0].