K. Teii, Diagnostics of the diamond depositing inductively coupled plasma by electrostatic probes and optical emission spectroscopy, J VAC SCI A, 17(1), 1999, pp. 138-143
Electrostatic probe methods and optical emission spectroscopy have been use
d for diagnostics of the low-pressure inductively coupled radio frequency p
lasma at pressures between 5 and 80 mTorr under real environments of diamon
d deposition. The single, triple, and emissive probe methods were used alon
e or combined to obtain electron temperature (T-e) and electron density (n(
e)). The single or triple probe method combined with the emissive probe met
hod allowed the determination of n(e) with high reliability as confirmed by
cross-checking. Comparison with the grown deposits suggested the existence
of a critical n(e) value of around 2 X 10(10) cm(-3), which was responsibl
e fur the drastic decrease in diamond growth rate observed below 10 mTorr a
nd the resulting no growth at around 5 mTorr. The energy distribution of ex
citation levels of the H atom Balmer series was almost constant and the dis
tribution equilibrium was not established except the case of 5 mTorr, which
was ascribed to the difference in the excitation process of H atoms. (C) 1
999 American Vacuum Society. [S0734-2101(99)05101-5].