Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition (vol A16, pg 2198, 1998)

Authors
Foster, JE Wendt, AE Wang, WW Booske, JH
Citation
Je. Foster et al., Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition (vol A16, pg 2198, 1998), J VAC SCI A, 17(1), 1999, pp. 322-322
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
1
Year of publication
1999
Pages
322 - 322
Database
ISI
SICI code
0734-2101(199901/02)17:1<322:DOMVIC>2.0.ZU;2-5