Raman linewidths of phonons in Si, Ge, and SiC under pressure

Citation
C. Ulrich et al., Raman linewidths of phonons in Si, Ge, and SiC under pressure, PHYS ST S-B, 211(1), 1999, pp. 293-300
Citations number
32
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
ISSN journal
03701972 → ACNP
Volume
211
Issue
1
Year of publication
1999
Pages
293 - 300
Database
ISI
SICI code
0370-1972(199901)211:1<293:RLOPIS>2.0.ZU;2-U
Abstract
We have investigated the pressure dependence of the lifetimes of zone-cente r optical phonons in Si, Ge, and 3C-SiC. The mechanism leading to a finite lifetime is the anharmonic decay into phonons of lower energy. Experimental ly, the lifetime is determined from the full width at half maximum of Raman lines measured at low temperature. The experimental results for the linewi dths as well as phonon frequencies are compared to results of ab-initio cal culations which are based. on third-order density functional perturbation t heory.