Ultrashort electron beam generation from resonantly excited nonlinear laser wakefield

Citation
K. Nagashima et al., Ultrashort electron beam generation from resonantly excited nonlinear laser wakefield, PHYS REV E, 59(1), 1999, pp. 1263-1266
Citations number
17
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW E
ISSN journal
1063651X → ACNP
Volume
59
Issue
1
Year of publication
1999
Part
B
Pages
1263 - 1266
Database
ISI
SICI code
1063-651X(199901)59:1<1263:UEBGFR>2.0.ZU;2-P
Abstract
A method for generating an ultrashort electron beam from a resonantly excit ed nonlinear wake field is proposed using a short laser pulse with a relati vistic intensity. The considerable amount of electrons up to 10 C/m(2) are extracted from an appropriate thin plasma layer. When the laser intensity i s highly relativistic, the electron beam is singly bunched and has a pulse length less than the laser wavelength and a large energy spread with a maxi mum energy of tens of MeV. [S1063-651X(99)11901-9].