A study of the FeSi(100) surface by X-ray photoelectron diffraction and low-energy ion scattering

Authors
Spolveri, I Atrei, A Bardi, U Torrini, M Rovida, G Martynyuk, V Vasiliev, M
Citation
I. Spolveri et al., A study of the FeSi(100) surface by X-ray photoelectron diffraction and low-energy ion scattering, SURF SCI, 419(2-3), 1999, pp. 303-307
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
419
Issue
2-3
Year of publication
1999
Pages
303 - 307
Database
ISI
SICI code
0039-6028(19990104)419:2-3<303:ASOTFS>2.0.ZU;2-6
Abstract
A single-crystal FeSi(100) sample has been studied by means of X-ray photoe lectron diffraction (XPD) and low-energy ion scattering (LEIS) in order to investigate the structure and the composition of the outermost atomic layer s. XPD intensity plots for the Fe 2p and Si 2s core levels were acquired, a nd the experimental results were compared with theoretical calculations. Go od agreement was found for the bulk-like surface model. The LEIS results in dicate that the surface is silicon-terminated. (C) 1999 Elsevier Science B. V. All rights reserved.