STM study of step graded Si1-xGex/Si(001) buffers

We report on the surface structure of step graded Si1-xGex/Si(001) buffers, as obtained by scanning tunneling microscopy (STM). The samples in this st udy were grown by means of rf magnetron sputter epitaxy (MSE). The study wa s performed by varying two essential growth parameters: the substrate tempe rature and the final Ge concentration sl of the buffer. The emergence of th e typical cross-hatched surface was monitored by investigating the surface at x(f) = 0.15, 0.20 and 0.30. The influence of the growth temperature was studied in the range between 370 and 570 degrees C. Even at the lowest temp eratures, the strain was found to be partially relieved as evidenced by the formation of a cross-hatch. (C) 1998 Published by Elsevier Science Ltd. Al l rights reserved.