Silicon quantum integrated circuits - an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques

Citation
Dj. Paul et al., Silicon quantum integrated circuits - an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques, THIN SOL FI, 336(1-2), 1998, pp. 130-136
Citations number
53
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
336
Issue
1-2
Year of publication
1998
Pages
130 - 136
Database
ISI
SICI code
0040-6090(199812)336:1-2<130:SQIC-A>2.0.ZU;2-U
Abstract
An introduction to the methodology, design concepts, fabrication routes and potential applications is presented of research to fabricate quantum devic es on a complementary metal oxide semiconductor (CMOS) fabrication line. Si /Si1-xGex heterostructure field effect transistors, velocity modulation tra nsistors and resonant tunnelling diodes are considered and initial fabricat ion stages discussed. (C) 1998 Elsevier Science S.A. All rights reserved.