Assessment of transport parameters for the design of high speed Si/SiGe HBTs with compositionally graded base

Citation
J. Weller et al., Assessment of transport parameters for the design of high speed Si/SiGe HBTs with compositionally graded base, THIN SOL FI, 336(1-2), 1998, pp. 137-140
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
336
Issue
1-2
Year of publication
1998
Pages
137 - 140
Database
ISI
SICI code
0040-6090(199812)336:1-2<137:AOTPFT>2.0.ZU;2-Z
Abstract
In heterojunction bipolar transistors current gain cut-off frequencies f(t) are limited by time constants of electron transport across the base and th e collector space charge zone. This point of view favours the use of small widths of the base. However, such a choice would increase the base resistan ce which is detrimental to the maximum frequency of oscillation f(max). A w ay out of this trade-off is to accelerate minority carriers by using a grad ed or step base structure. Besides their potential to keep transit times lo w such sophisticated HBT structures may show, in addition, an active behavi our above the cut-off frequencies due to the transit time effect which is c ommonly ignored in bipolar transistors. A key parameter for that is the min ority diffusion constant of electrons in the SiGe base. Our experimental st udy on this parameter in the present work indicates a value that is above t hat of minority carrier transport in purl silicon. (C) 1998 Published by El sevier Science Ltd. All rights reserved.