G. Hock et al., Carrier mobilities in modulation doped Si1-xGex heterostructures with respect to FET applications, THIN SOL FI, 336(1-2), 1998, pp. 141-144
Room temperature carrier mobilities in both p- and n-type modulation doped
SiGe heterostructures were investigated by the magnetic field dependent Hal
l (B-Hall) technique. B-Hall allows a selective determination of mobility a
nd sheet carrier density in the channel and in parasitic parallel conductin
g layers. The heterostructures grown by MBE on Si (100) substrates consiste
d of a strained Si1-xGex, channel on a Si1-yGey strain relieved buffer (SRB
) with x - y = 0.3. Structural assessment was done by high resolution X-ray
diffraction (HR-XRD) and cross-sectional TEM (XTEM). The hole mobility in
p-type heterostructures depends clearly on the Ge content x in the channel
and increases from 635 cm(2)/Vs for a SiGe alloy layer with x = 0.67 up to
1665 cm(2)/Vs for a pure Ge channel, which is close to the value of undoped
bulk Ge. For the corresponding n-type structure with a Si channel on a Si0
.7Ge0.3 SRB, a room temperature electron mobility of 2700 cm(2)/Vs was meas
ured. (C) 1998 Elsevier Science S.A. All rights reserved.