HgCdTe thin films have been obtained on the Al2O3 surface by the pulse lase
r deposition method in dynamic vacuum. Films grown at the temperature windo
w of 470-490 K exhibit relatively small electrical resistance. The resistan
ce-temperature characteristics of the films are compared to those of the ta
rget and they clearly point to intrinsic and impurity regions. The temperat
ure dependency of the Hall coefficient, the stationary and kinetic photocon
ductivity of the layers as well as the life time of charge carriers have be
en studied. (C) 1998 Elsevier Science S.A. All rights reserved.