Citation
Wk. Cho et al., Optimization of inlet concentration profile for uniform deposition in a cylindrical chemical vapor deposition chamber, INT J HEAT, 42(6), 1999, pp. 1141-1146
Citations number
9
Categorie Soggetti
Mechanical Engineering
Journal title
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER
ISSN journal
00179310
→ ACNP
Volume
42
Issue
6
Year of publication
1999
Pages
1141 - 1146
Database
ISI
SICI code
0017-9310(199903)42:6<1141:OOICPF>2.0.ZU;2-E