Microstructure and magnetic behaviors of Fe/Hf multilayers by vapor deposition

Citation
Zs. Zhang et al., Microstructure and magnetic behaviors of Fe/Hf multilayers by vapor deposition, J MAGN MAGN, 192(1), 1999, pp. 53-60
Citations number
32
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
192
Issue
1
Year of publication
1999
Pages
53 - 60
Database
ISI
SICI code
0304-8853(199902)192:1<53:MAMBOF>2.0.ZU;2-1
Abstract
Electron beam vapor deposition was employed to prepare Fe/Hf multilayers. T he thickness, periodicity, chemical composition, microstructure and magneti c properties of the films were characterized and measured by various method s. It was found that the Fe layer could grow in an amorphous structure when the Fe layer thickness t(Fe) less than or equal to 2.2 nm and the Hf layer thickness 1.8 nm less than or equal to t(Hf) less than or equal to 13.2 nm . The magnetic moment per Fe atom in Fe/Hf multilayers reduced considerably with forming amorphous Fe when Hf was fixed at 13.2 nm. For the Fe/Hf mult ilayers with amorphous Fe, the magnetic moment per Fe atom changed strongly with the thickness of constituent metals, Possible mechanism responsible f or these observations are also discussed. (C) 1999 Elsevier Science B.V. Al l rights reserved.