Electron beam vapor deposition was employed to prepare Fe/Hf multilayers. T
he thickness, periodicity, chemical composition, microstructure and magneti
c properties of the films were characterized and measured by various method
s. It was found that the Fe layer could grow in an amorphous structure when
the Fe layer thickness t(Fe) less than or equal to 2.2 nm and the Hf layer
thickness 1.8 nm less than or equal to t(Hf) less than or equal to 13.2 nm
. The magnetic moment per Fe atom in Fe/Hf multilayers reduced considerably
with forming amorphous Fe when Hf was fixed at 13.2 nm. For the Fe/Hf mult
ilayers with amorphous Fe, the magnetic moment per Fe atom changed strongly
with the thickness of constituent metals, Possible mechanism responsible f
or these observations are also discussed. (C) 1999 Elsevier Science B.V. Al
l rights reserved.