Oxygen K-edge x-ray-absorption fine-structure study of surface methoxy species on Cu(111) and Ni(111)

Citation
K. Amemiya et al., Oxygen K-edge x-ray-absorption fine-structure study of surface methoxy species on Cu(111) and Ni(111), PHYS REV B, 59(3), 1999, pp. 2307-2312
Citations number
43
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
3
Year of publication
1999
Pages
2307 - 2312
Database
ISI
SICI code
0163-1829(19990115)59:3<2307:OKXFSO>2.0.ZU;2-I
Abstract
The atomic and electronic structures of the methoxy (CH3O) adsorbate formed on the Cu(111) and Ni(111) surfaces have been studied by NEXAFS (near-edge x-ray-absorption fine structure) and SEXAFS (surface extended x-ray-absorp tion fine structure) with a newly constructed soft x-ray beamline in the Ph oton Factory. The transition from the O 1s core to the 2e level of the meth oxy species was found to be noticeably stronger on Ni(111)than on Cu(111), indicating that the methoxy adsorbate on Cu(111) is more anionic. The C-O b ond lengths of the species on Cu(111) and Ni(111) were estimated using the sigma*(C-O) resonance to be 1.46 +/-0.05 and 1.43+/-0.05 Angstrom, respecti vely. The polarization-dependent NEXAFS measurements showed that the C-O ax is of the methoxy adsorbate is nearly perpendicular to the surface on both Cu(111) and Ni(111). From the SEXAFS analysis on Cu(111), it was revealed t hat the oxygen atom of the methoxy species locates on a threefold hollow si te and the nearest-neighbor O-Cu distance was determined to be 2.00+/-0.03 Angstrom. [S0163-1829(99)04903-6].