Photoelectron diffraction study of ultrathin Fe films on Cu{111}

Citation
A. Theobald et al., Photoelectron diffraction study of ultrathin Fe films on Cu{111}, PHYS REV B, 59(3), 1999, pp. 2313-2319
Citations number
44
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
3
Year of publication
1999
Pages
2313 - 2319
Database
ISI
SICI code
0163-1829(19990115)59:3<2313:PDSOUF>2.0.ZU;2-5
Abstract
Using photoelectron diffraction in the scanned-energy mode we show that at 300 K iron grows pseudomorphically on Cu{111} up to a thickness of about tw o equivalent monolayers. The Fe-Cu layer separation is 1.99 Angstrom. Above this thickness the film becomes bcc with {110} orientation and is aligned such that the [111] rows are parallel to the [110] rows of the fcc{111} sur face (Kurdjumov-Sachs orientation). The Fe-Fe first-layer separation is 1.9 5 Angstrom. [S0163-1829(99)01903-7].