In situ process control of electrolytic metal deposition

Authors
Citation
W. Plieth, In situ process control of electrolytic metal deposition, Z PHYS CHEM, 208, 1999, pp. 211-223
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-INTERNATIONAL JOURNAL OF RESEARCH IN PHYSICAL CHEMISTRY & CHEMICAL PHYSICS
ISSN journal
09429352 → ACNP
Volume
208
Year of publication
1999
Part
1-2
Pages
211 - 223
Database
ISI
SICI code
0942-9352(1999)208:<211:ISPCOE>2.0.ZU;2-K
Abstract
This work describes optical methods of process control based on the angle d istribution measurements of the intensity of laser Light which is scattered in situ from a metal surface on which a galvanic deposition evolves. From the distribution diagram of the laser Light, an auto correlation function c an be calculated via the Fourier transformation method making available inf ormation or data representing the distance of structural roughness. This in formation can then be employed as data in a regulation process. A further d evelopment of this method on a variety of metals, copper, gold and silver i s based on the application of surfaced enhanced Raman spectroscopy towards the analytical determination of the surface concentration of additives. It can be shown that through the structural sensitiveness of the enhanced surf ace Raman spectroscopy, the development of surface structures such as nucle ation phenomena can be observed.