The design, growth by metalorganic chemical vapor deposition, and processin
g of an In0.07Ga0.93As0.98N0.02 solar cell, with 1.0 eV band gap, lattice m
atched to GaAs is described. The hole diffusion length in annealed, n-type
InGaAsN is 0.6- 0.8 mu m, and solar cell internal quantum efficiencies >70%
are obtained. Optical studies indicate that defects or impurities, from In
GaAsN doping and nitrogen incorporation, limit solar cell performance. (C)
1999 American Institute of Physics. [S0003-6951(99)01805-7].