Deposition of electro-optics and ferroelectric oxides by pulsed laser ablation

Pulsed laser deposition technique is very well suited for thin film prepara tion of multicomponent oxides. It has been applied to the deposition of sup erconductor, ferroelectric and electrooptics oxides. The main advantages of the technique are briefly summarised in this review, moreover some physica l mechanisms leading to a film composition departure from the target one ar e analysed. Particular attention is paid on the laser-induced modification of the target, scattering in the plume, film diffusion into the substrate a nd reevaporation from the film. These phenomena are illustrated with niobat e and lead titanate oxides. The proper understanding of these phenomena all ows the optimisation of the deposition parameters to achieve specific cryst alline films suited for some microelectronics and optical applications.