Y. Uchida et al., Determination of the mean absorption potential of Si for electrons by energy loss spectroscopy, CRYST RES T, 34(1), 1999, pp. 103-113
Complex structure potentials of silicon for 111 systematic diffraction were
measured by convergent beam electron diffraction technique (Kossel - Molle
nstedt pattern). The imaginary mean potential and its different components
were determined directly by measuring the energy loss spectra of transmitte
d electrons by means of an imaging filter (GIF) installed in the electron m
icroscope. The imaginary mean inner potential was estimated to be 0.63 eV.
The component of the imaginary inner potential due to plasmon excitation wa
s estimated to be 0.53 eV. Some low indexed Fourier components were determi
ned by matching intensity simulations to Kossel-Mollenstedt patterns. The a
bsorption potential due to thermal vibration was found to be in the order o
f the full Einstein model.