Inductive plasma sources for plasma implantation and deposition

External and reentrant radio frequency inductive plasma sources are develop ed for plasma ion implantation and deposition processes in a 1.8 m(3) vacuu m vessel. Plasma densities in the range 10(16)-10(17) m(-3) are desirable f or the above processes. External plasma sources could not yield the require d plasma densities because of high particle losses in the transition region between the source and the main vessel. The particle losses are clarified through experiments and analysis, with and without multipole magnetic confi nement. Reentrant plasma sources eliminate transmission losses and yield hi gh plasma densities with good spatial uniformity.