Plasma-assisted deposition of a three-layer structure by vacuum and gas arcs

Citation
Dp. Borisov et al., Plasma-assisted deposition of a three-layer structure by vacuum and gas arcs, IEEE PLAS S, 26(6), 1998, pp. 1680-1684
Citations number
9
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
26
Issue
6
Year of publication
1998
Pages
1680 - 1684
Database
ISI
SICI code
0093-3813(199812)26:6<1680:PDOATS>2.0.ZU;2-C
Abstract
The durability and adhesion of thin coatings often depends on the structure and properties of the layer intermediate between the coating and the subst rate, especially in the case where the layer and the substrate are highly d ifferent in microhardness, With a vacuum are and a hot-cathode are, a proce ss has been arranged which involves cleaning of the surface, nitration of t he article, and deposition of a coating. As a result, a three-layer composi tion has been produced which consists of a TiN layer of thickness up to 5 m u m and microhardness 20 GPa, an intermediate Fe4N layer of thickness up to 8 mu m and microhardness 7.5 GPa, and a nitrated layer of thickness up to 100 mu m with a gradually varying microhardness. With the TiN layer showing high adhesion, the coating has a durability three of four times greater th an that of a coating produced with the use of a conventional technology.