M. Chorro et al., Adsorption mechanism of conventional and dimeric cationic surfactants on silica surface: Effect of the state of the surface, J COLL I SC, 210(1), 1999, pp. 134-143
The aim of this study was to investigate the effect of the state of the sil
ica surface and of the surfactant molecular structure on the adsorption of
cationic surfactants onto silica. Thus, the adsorption of DTAB (dodecyltrim
ethylammonium bromide) and of the dimeric surfactant 12-2-12 (ethanediyl-1,
2-bis(dodecyldimethyl-ammonium bromide)) on raw silica (SiNa) and on HCl-wa
shed silica (SM) has been investigated under "free" system conditions, The
amount of surfactant adsorbed (adsorption isotherm), the sodium ion and bro
mide ion concentrations and the pH in the equilibrated supernatant, and the
silica particle electrophoretic mobility have been measured along the isot
herms. The adsorption mechanisms of the two surfactants on the raw and wash
ed silica are qualitatively similar. Nevertheless, important quantitative d
ifferences are observed which are all due to (i) the larger number of surfa
ce sites present at the surface of SiNa with respect to SiH and (ii) the la
rger ionic strength of the supernatant in SiNa/surfactant systems with resp
ect to SiH/surfactant systems, due to the much larger amount of sodium ions
released by SiNa upon surfactant binding. Thus, the amounts of surfactant
adsorbed at the point of zero charge and at saturation of the silica partic
les, of sodium ions released by the surface and the decrease of critical mi
celle concentration (cmc) in the supernatant with respect to pure water are
all larger for the raw silica than for the treated silica. For the four si
lica/surfactant systems investigated, the first adsorption step corresponds
to the adsorption of individual surfactant ions on the negative sites of t
he silica surface. It is driven by electrostatic interactions and strongly
dependent on the number of surface sites and ionic strength associated to t
he released ions. At the end of the first adsorption step, which is clearly
seen with SiH/surfactant systems, the second adsorption step starts. This
step is driven by hydrophobic interaction between surfactant alkyl chains a
nd results in the formation of surface aggregates. The surfactant adsorptio
n on the surface is shown to continue even after the cmc in the supernatant
is reached. (C) 1999 Academic Press.