Adsorption mechanism of conventional and dimeric cationic surfactants on silica surface: Effect of the state of the surface

Citation
M. Chorro et al., Adsorption mechanism of conventional and dimeric cationic surfactants on silica surface: Effect of the state of the surface, J COLL I SC, 210(1), 1999, pp. 134-143
Citations number
22
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
210
Issue
1
Year of publication
1999
Pages
134 - 143
Database
ISI
SICI code
0021-9797(19990201)210:1<134:AMOCAD>2.0.ZU;2-3
Abstract
The aim of this study was to investigate the effect of the state of the sil ica surface and of the surfactant molecular structure on the adsorption of cationic surfactants onto silica. Thus, the adsorption of DTAB (dodecyltrim ethylammonium bromide) and of the dimeric surfactant 12-2-12 (ethanediyl-1, 2-bis(dodecyldimethyl-ammonium bromide)) on raw silica (SiNa) and on HCl-wa shed silica (SM) has been investigated under "free" system conditions, The amount of surfactant adsorbed (adsorption isotherm), the sodium ion and bro mide ion concentrations and the pH in the equilibrated supernatant, and the silica particle electrophoretic mobility have been measured along the isot herms. The adsorption mechanisms of the two surfactants on the raw and wash ed silica are qualitatively similar. Nevertheless, important quantitative d ifferences are observed which are all due to (i) the larger number of surfa ce sites present at the surface of SiNa with respect to SiH and (ii) the la rger ionic strength of the supernatant in SiNa/surfactant systems with resp ect to SiH/surfactant systems, due to the much larger amount of sodium ions released by SiNa upon surfactant binding. Thus, the amounts of surfactant adsorbed at the point of zero charge and at saturation of the silica partic les, of sodium ions released by the surface and the decrease of critical mi celle concentration (cmc) in the supernatant with respect to pure water are all larger for the raw silica than for the treated silica. For the four si lica/surfactant systems investigated, the first adsorption step corresponds to the adsorption of individual surfactant ions on the negative sites of t he silica surface. It is driven by electrostatic interactions and strongly dependent on the number of surface sites and ionic strength associated to t he released ions. At the end of the first adsorption step, which is clearly seen with SiH/surfactant systems, the second adsorption step starts. This step is driven by hydrophobic interaction between surfactant alkyl chains a nd results in the formation of surface aggregates. The surfactant adsorptio n on the surface is shown to continue even after the cmc in the supernatant is reached. (C) 1999 Academic Press.