RHEED oscillation studies of pseudomorphic InGaAs strained layers on GaAs substrate

Citation
Jy. Leem et al., RHEED oscillation studies of pseudomorphic InGaAs strained layers on GaAs substrate, J CRYST GR, 197(1-2), 1999, pp. 84-88
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
197
Issue
1-2
Year of publication
1999
Pages
84 - 88
Database
ISI
SICI code
0022-0248(199902)197:1-2<84:ROSOPI>2.0.ZU;2-L
Abstract
We use reflection high-energy electron diffraction (RHEED) oscillations to study the substrate temperature and In/Ga flux ratio dependencies of the gr owth of pseudomorphic InGaAs layers on GaAs. The growth of InGaAs on GaAs s hows strongly damped oscillations which is dependent on the substrate tempe rature. The In mole fraction drops almost linearly with increasing substrat e temperature above 580 degrees C, with a dropping rate of 0.08-0.13%/degre es C which is dependent on In/Ga beam equivalent pressure (BEP) ratio. The In mole fraction drops almost linearly with decreasing substrate temperatur e below 500 degrees C. The decrease below 500 degrees C reported here is ob served for the first time. (C) 1999 Elsevier Science B.V. All rights reserv ed.