Post-growth, In doping of CdTe single crystals via vapor phase

Citation
V. Lyahovitskaya et al., Post-growth, In doping of CdTe single crystals via vapor phase, J CRYST GR, 197(1-2), 1999, pp. 106-112
Citations number
20
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
197
Issue
1-2
Year of publication
1999
Pages
106 - 112
Database
ISI
SICI code
0022-0248(199902)197:1-2<106:PIDOCS>2.0.ZU;2-6
Abstract
We have developed a new, efficient method to dope bulk single crystals of C dTe by In, via gas phase diffusion, using In4Te3 as the source. Doping was carried out on crystals of very high resistivity (>5 M Omega cm), following annealing in the temperature range of 350-1000 degrees C. Resulting crysta ls showed n-type conductivity with a free carrier concentration in the rang e: of 10(15)-10(18) cm(-3) and carrier mobility of 100-750 cm(2)/(V s), dep ending on the annealing temperature and time, and on the cooling conditions . Incorporation of In was found to be a function of annealing time and temp erature only. Up to 650 degrees C, the In and the free electron concentrati ons are roughly the same. (C) 1999 Elsevier Science B.V. All rights reserve d.