A new micromachining process, i.e., Cover-on-Meshes technique for Single-ch
ip fabrication of Three-dimensional structures (CoMSaT), is proposed and us
ed for the fabrication of micro integrated-fluid systems (IFS). In this tec
hnique, a two-stage etching process, including quick sacrificial layer etch
ing and silicon anisotropic etching, is applied to the fabrication. Both us
e the etching holes (meshes) on the anti-etching membranes through which th
e etchant can pass freely. After the etching, an LTO layer is deposited usi
ng low pressure chemical vapor deposition (LPCVD) to cover the opened meshe
s. Real three dimensional structures with membranes suspended on deep cavit
ies can be formed by use of such an single-chip fabrication. The technique
makes it possible to produce 3D structures without wafer/chip bonding and a
lignment, resulting in an easy integration of on-chip electric-circuits and
an easy miniaturization of the 3D systems. Various micro-pumps, micro-valv
es with pressure sensors, temperature sensors and micro-actuators have been
on-chip integrated with electric-circuits within an area of 5.9 mm x 6.4 m
m. The primary experiments show that this technique is promising in the fab
rication of miniature integrated fluid systems. (C) 1999 Elsevier Science S
.A. All rights reserved.